Evaluation and Characterization of Thin Films on AISI 9840 by Electrochemical Noise

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dc.contributor.authorC.P. Castillo Morquecho
dc.contributor.authorC. López-Meléndez
dc.contributor.authorHilda Esperanza Esparza Ponce
dc.contributor.authorA. Duarte-Möller
dc.contributor.authorVíctor M. Orozco-Carmona
dc.contributor.authorCitlalli Gaona-Tiburcio
dc.contributor.authorFacundo Almeraya-Calderón
dc.contributor.authorA. Martínez-Villafañe
dc.coverage.spatialBolivia
dc.date.accessioned2026-03-22T18:03:49Z
dc.date.available2026-03-22T18:03:49Z
dc.date.issued2015
dc.identifier.doi10.1016/s1452-3981(23)05057-5
dc.identifier.urihttps://doi.org/10.1016/s1452-3981(23)05057-5
dc.identifier.urihttps://andeanlibrary.org/handle/123456789/67888
dc.language.isoen
dc.publisherElsevier BV
dc.relation.ispartofInternational Journal of Electrochemical Science
dc.sourceCentro de Investigación en Materiales Avanzados
dc.subjectElectrochemical noise
dc.subjectMaterials science
dc.subjectCharacterization (materials science)
dc.subjectElectrochemistry
dc.subjectNoise (video)
dc.subjectNanotechnology
dc.subjectOptoelectronics
dc.titleEvaluation and Characterization of Thin Films on AISI 9840 by Electrochemical Noise
dc.typearticle

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